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Asian Research Organization for Surface Finishing and New Technology by UV, EB, Laser and ion Beams Partner of RadTech North America and RadTech Europe

見出しPROGRAM

Program at a Glance    Program at a Glance

Keynote Speaker

Prof. Hiroshi Amano
Nagoya University
(Nobel Laureate in Physics 2014)
Date: Oct. 25 (Tue) 13:40 - 14:40
Title: Present and Future Prospect of UV/DUV LEDs & LDs

Area Overview

Overview for North America
David Harbourne Heraeus Noblelight N.America, USA
Overview for China
Jianwen Yang President, RadTech China, China
Overview for Korea
In Hyo Kim President, RadTech Korea, Korea
Overview for Japan
Zen Komiya JSR, Japan
Overview for Europe
David Helsby President, RadTech Europe, Switzerland

Invited Speakers

University of Haute Alsace, France
Koji Arimitsu Tokyo University of Science, Japan
Christopher N. Bowman University of Colorado, USA
Kurt Dietliker Swiss Federal Institute of Technology, Switzerland
Syuji Fujii Osaka Institute of Technology, Japan
Hidemitsu Furukawa Yamagata University, Japan
Allan Guymon University of Iowa, USA
Teruaki Hayakawa Tokyo Institute of Technology, Japan
Yoshihiko Hirai Osaka Prefecture University, Japan
Tetsuhiko Inazu NIKKISO CO., LTD., Japan 
Maki Itoh Dow Corning, Japan
Toshihide Kamata AIST, Japan
Nobuhiro Kawatsuki University of Hyogo, Japan
Yasunari Maekawa JAEA, Japan
Shinji Matsui University of Hyogo, Japan
Kimihiro Matsukawa Osaka Municipal Technical Research Institute, Japan
Tokuji Miyashita Tohoku University, Japan
Takashi Miyata Kansai University, Japan
Jun Nie Beijing University of Chemical Technology, China
Yasuhiro Okada J-TECHNO CREATION, Japan
Im Rangwalla Energy Sciences Inc., USA
Jason Rolland Carbon3D Inc., USA
Takahiro Sato JAEA, Japan
Takahiro Seki Nagoya University, Japan
Atsushi Shishido Tokyo Institute of Technology, Japan
Shojiro Sueta Chemicals Evaluation and Research Institute, Japan
Takeo Suga Waseda University, Japan
Katsuaki Suganuma Osaka University, Japan
Kazuyuki Suzuki Technohill Corporation, Japan
Kentaro Taki Kanazawa University, Japan
Takeo Watanabe University of Hyogo, Japan
Dean C. Webster  North Dakota State University, USA
Yoichi Yoshida Osaka University, Japan
Tomohiro Yoshida Toray Research Center, Inc., Japan

Program Schedule (Tentative)

Oral

10/25 Tue
Room A + B (Apollon A+B)
Area Overview9:30-12:30
An overview of current and future markets for UV/EB curing technologies David Harbourne Heraeus Noblelight America LLC Markets Overview and Progress of UV/EB Curing Technology in China Jianwen Yang Sun Yat-sen University Korean Market Overview In Hyo Kim Shinyoung Rad.Chem.Ltd. Abstract of “Overview of UV/EB technology and market in Japan” Zen Komiya JSR Corporation Market overview 2015: Overview of the European market for Radiation Curing David Helsby Rahn AG
Keynote Lecture13:40-14:40
Present and Future Prospect of UV/DUV LEDs & LDs Hiroshi Amano Nagoya University
S-1 LED Related Technology15:10-16:40
Photoinitiators for UV-LED Applications Kurt Dietliker Swiss Federal Institute of Technology Zurich (ETH-Z) Photopolymerization under LED: from tack-free coatings to carbon fiber-reinforced composites X. Allonas, M. Lecompère, M. Retailleau, F. Karasu, A. Ibrahim, and C. Croutxé-Barghorn University of Haute Alsace Silicone Encapsulants for High Brightness LED Maki Itoh, Michitaka Suto, Tomohiro Iimura and Toshiki Nakata Dow Corning, Ichihara, Chiba, Japan Jung Hye Chae Dow Corning, Gwanghyewon-Myon, Jincheon-Gun, Korea Randall G. Schmidt Dow Corning, Midland, Michigan, U.S.A
Room C (Sirius B)
G-2 Advanced Materials and Applications15:10-17:50
Structure-property relationships of photo-polymerized CuAAC networks for the application of tough industrial thermosets C. N Bowman, H. B. Song, A. Baranek, M. McBride, and A. Alzahrani Department of Chemical and Biological Engineering, University of Colorado Boulder Free surface command layer for the photoalignment of polymer liquid crystals T. Seki, K. Fukuhara, D. Tanaka, T. Nakai, and M. Hara Department of Molecular Design and Engineering, Graduate School of Engineering, Nagoya University Light-Driven Delivery and Release of Materials Using Liquid Marbles S. Fujii, H. Kawashima, and Y. Nakamura* Department of Applied Chemistry, Faculty of Engineering, Osaka Institute of Technology H.-J. Butt, M. Paven, and S. Nagano Department of Chemistry, Asahikawa Medical University H. Mayama Physics at Interfaces, Max Planck Institute for Polymer Research Graphene aerogel produced by effective radiation-induced self-assembly and its application for oil-water separation Jihao Li, and Jingye Li Shanghai Institute of Applied Physics, Chinese Academy of Sciences Attractive Properties by EB Induced Formation of Active Terminated Atoms with Dangling Bonds Yoshitake Nishi, Michael C. Faudree, Akira Tonegawa, Masaaki Takashiri, Ryuichiro Ohyama, and Masataka Tomizawa Graduate school of Engineering, Tokai University Masae Kanda and Noriyuki Inoue Center of Applied Superconductivity & Sustainable Energy Research, Chubu University Selective surface modification at photo-irradiated area of a polymer film by reaction development patterning Toshiyuki OYAMA, Haruki KAWABATA, Kyosuke WATANABE, and Hisashi OGASAWARA Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University
Room D (Sirius A)
G-1 Radiation and Photochemistry15:10-17:50
Oxygen Inhibition of Photopolymerization Jun Nie College of Science, Beijing University of Chemical Technology Femtosecond pulse radiolysis study on decomposition processes of alkanes Y.Yoshida, S. Nishii, T. Kondoh, M. Gohdo, K. Kan, and J. Yang The Institute of Scientific and Industrial Research, Osaka University Application to Photoreactive Materials of Photochemical Generation of Superbases with High Efficiency Koji Arimitsu Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science Visible-Light Initiated Thiol-Michael Addition Photopolymerization Reactions Shunsuke Chatani Mitsubishi Rayon Co., Ltd., Yokohama, Japan and University of Colorado, Boulder, U. S. A. Christopher N. Bowman University of Colorado, Boulder, U. S. A. Pulse Radiolysis Study Of Reaction Kinetics On Radiation Induced Reaction Of Polystyrene M. Gohdo, T. Kondoh, K. Kan, Y. Jinfeng, S. Tagawa, and Y. Yoshida The Institute of Scientific and Industrial Research, Osaka University Modification of PEN and PET Film Surfaces by Plasma Treatment, Layer-by-Layer Assembly of Polyelectrolyte Multilayer Thin Films and Electroless Deposition T. Tamai, M. Watanabe Osaka Municipal Technical Research Institute Y. Nakahara, K. Kimura Department of Applied Chemistry, Faculty of Systems Engineering, Wakayama University
Room E (Jupiter)
S-4 Lithography and Nanoimprint15:10-18:00
Current issues and breakthrough toward sub 10nm patterning by nanoimprint technology Masaaki Yasuda and Yoshihiko Hirai Osaka Prefecture University Current Status and Prospects of Nanoimprint Technology Shinji Matsui University of Hyogo Development of Next Generation Block Copolymer Lithography Materials From Design and Synthesis to Orientation Control of Nanodomains Teruaki Hayakawa Tokyo Institute of Technology Development of EUV Lithographic Technology at University of Hyogo Center for EUVL, Laboratory of Advanced Science and Technology for Industry, University of Hyogo T. Watanabe and T. Harada Center for EUVL, Laboratory of Advanced Science and Technology for Industry, University of Hyogo Tellurium-containing resist materials for extreme ultraviolet (EUV) exposure tool M. Fukunaga, H. Takeda, and H. Kudo Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University Super-large mold fabrication process for Nanoimprint Mass-production Tomoaki Kasai, Misato Yamanaka, Ikumi Sakata, Takahide Mizawa Soken Chemical & Engineering Co., Ltd.
10/26 Wed
Room A (Apollon B)
S-1 LED Related Technology9:00-11:40
Investigation of cure behavior of UV curable coatings for optical fiber by UV-LED lamps Katsuyuki Takase, Hirofumi Uchida, and Zen Komiya Tsukuba Research Laboratories, JSR Cationic Photopolymerization of Bisphenol A diglycidyl ether Epoxy under UVLED Kai Jian, Guodong Liu, and Jun Nie College of Materials Science and Engineering, Beijing University of Chemical Technology Kai Jian, Yuan Chen, and Jinliang Yang Changzhou Tronly New Electronic Materials Co.,Ltd. Photocuring of Acrylates using Deep UV LEDs H. Okamura and A. Matsumoto Department of Applied Chemistry, Osaka Prefecture University S. Niizeki and T. Ochi Nikkiso Giken Co., Ltd. What happens, when TPO is selectively irradiated by mono-chromatic LED? Kazuo Ashikaga and Kiyoko Kawamura Heraeus K.K. Development of High Output Power Deep Ultraviolet Light-Emitting Diodes T. Inazu, C. Pernot, H. Ichinokura, T. Ochi, and H. Ishiguro UV-LED Division, Nikkiso Giken Co., Ltd., Japan H. Tomozawa Hakusan Factory, Nikkiso Co., Ltd., Japan H. Amano Center for Integrated Research of Future Electronics, Nagoya University, Japan New photoinitiators having good absorption for the LED light source. Naomi Sato Adeka Corporation
G-3 Radcure Equipment, Testing, and Measurement11:40-12:00
Development of mercury-free electrodeless metal halide lamp and its equipment Haojun Zhang, Kazuaki Satou, Seiji Saito, Yuji Oda, Tsuyoshi Todo, and Takashi Ibi Iwasaki Electric Co., Ltd.
Room B (Apollon A)
S-2 3D Printing Technology9:00-10:20
3D Gel Printer Inducing Soft-matter Innovation Hidemitsu Furukawa, Masaru Kawakami, Masato Makino, Ajit Khosla, Azusa Saito, Kazuyuki Sakai, Mai Kodama, Kyuichiro Takamatsu, Masato Wada, and Hideaki Tamate Soft & Wet matter Engineering Lab (SWEL), Life-3D Printing Innovation Center (LPIC), Yamagata University Photopolymerization kinetics of different chain sizes of bi-functional acrylic monomers using real time FT-IR K. Taki, T. Taguchi, R. Hayashi, and H. Ito Kanazawa University Latest domestic and foreign situations concerning Chemical substance management and safe use of 3D printer materials Kazuyuki Suzuki Technohill Corporation
G-1 Radiation and Photochemistry10:50-11:50
Relation between Reactivity of Iodonium Salts in NIR Photoinitiating Systems Comprising Anions with Different Coordination Behavior Atsushi Shiraishi and Yasuhiro Ueda San-Apro Ltd Dennis Oprych, Christian Schmitz, Thomas Brömme, Annett Halbhuber, and Bernd Strehmel Niederrhein University of Applied Sciences, Department of Chemistry and Institute for Coatings and Surface Technology Correlation between surface functional groups and bonding strength in VUV Surface Activated Bonding(SAB) M. Sakai, G. Yamada, S. Matsuzawa, M. Wasamoto and K. Hirose Ushio Inc. Next-Generation Photoinitiators for LED Curing and Low Migration Elena Bellotti, Angelo Casiraghi, Marika Morone, and Gabriele Norcini IGM Resins,Italia Stephen R. Postle IGM Resins Inc., USA.
Room C (Sirius A)
G-2 Advanced Materials and Applications9:00-12:00
Innovation Challenges with New UV/EB Technologies Daisuke Kitahara, Yoshihito Matsumura, and Yoshitake Nishi Tokai university Akiko Minegishi and Masae Kanda Tyubu university EB-Strengthening Methods of ERTPs Composites Inside Ryo Nomura, M. C. Faudree, Anna Takahashi, Itaru Jimbo and Yoshitake Nishi Tokai University Masae Kanda Chubu University EB Induced Fracture Resistance of Ceramics N. Tsuyuki, K. Iwata, K. Takashina, N. Yamaguchi, H. Hasegawa, and A. Takahashi Graduate School of Engineering, Tokai University H. Tachi, M. C. Faudree, Y. Matsumura, and Y. Nishi School of Engineering, Tokai University Multi-functional O-Acyloyloximes as Novel Photolabile Crosslinkers Kanji Suyama Faculty of Liberal Arts and Sciences, Osaka Prefecture University Controlled Surface Chemistry and Properties through Photo-enforced Stratification C. Allan Guymon and Clinton J. Cook Department of Chemical & Biochemical Engineering, University of Iowa Functional Fabrics by Radiation Induced Graft olymerization Methods Jingye Li and Ming Yu Shanghai Institute of Applied Physics, Chinese Academy of Sciences Novel Dendritic thiol-ene photopolymers with excellent UV-curing properties K. Aoki and M. Yamada Department of Chemistry, Faculty of Science, Tokyo University of Science R. Imanishi Department of Molecular Design and Engineering, Graduate School of Engineering,Nagoya University
Room A (Apollon B)
G-3 Radcure Equipment, Testing, and Measurement13:30-15:20
Photopolymerization kinetics of different chain sizes of bi-functional acrylic monomers using real time FT-IR K. Taki, Y. Watanabe, H. Ito, and M. Ohshima Kanazawa University Development and Application of Micro-Particle-Induced X/Gamma-ray Emission T. Satoh, M. Koka, N. Yamada, and T. Kamiya Takasaki Advanced Radiation Research Institute, National Institutes for Quantum and Radiological Science and Technology K. Mima The Graduate School for the Creation of New Photonics Industries K. Dobashi Faculty of Medicine, Gunma University New Photon Delivery System Kiyoko Kawamura, and Kazuo Ashikaga Heraeus K.K. Preparation and properties of UV curable anti-glare coatings containing light absorption and scattering PMMA/nano-carbon composite particles Lu Hu, Zhu Yang, Xiaoping Zhang, Zhenyu Liu, Ping Xia, Lulu Gong, and Lei Jiang Hubei Institute of Aerospace Chemotechnology
Room B (Apollon A)
S-3 Printed Electronics13:30-15:10
Transparent Conductive Electrode Technology of Silver Nanowires Eri Nakazawa and Shigeru Yamaki Business Development Center, Showa Denko K. K. Insulation material for inkjet printing Masayuki Shimura TAIYO INK MFG.CO.,LTD. Novel Photo-thermally Cured Acrylic Anchor Resins for Screen Printing -Design for fine line electrodes- K. Takada, J. Hamuro, and T. Matoba SHIN-NAKAMURA CHEMICAL Corp. M. Yamashita Industrial Technology Center of Wakayama Prefecture M. Shirai and H. Okamura Department of Applied Chemistry, Osaka Prefecture University Fabrication of Hybrid Materials and Surface Modification for Printed Electronic Tokuji Miyashita Tohoku University
Room C (Sirius A)
G-2 Advanced Materials and Applications13:30-15:20
New Aspects of Radiation-induced Graft-polymerization and its Application to Fuel Cell Polymer Electrolyte Membranes Yasunari Maekawa Takasaki Advanced Radiation Research Institute, National Institutes for Quantum and Radiological Science and Technology (QST) Rational Design of Stimuli-Responsive Polymeric Materials Using Photocrosslinking and Their Applications Takashi Miyata Department of Chemistry and Materials Engineering, Kansai University Development and characteristic of the UV coating material based on silicon technology Youichi Matsuo, and Yasushi Nakanishi High Performance Polymer Division, KANEKA CORPORATION Mikio Akutsu Radtech Support Preparation of heteropoly acid-hybridized photopolymers for transparent high refractive index materials T. Morinaga, M. Kume, and Y. Ohe Toppan Printing Co., Ltd T. Hoashi, H. Ihara, and M. Takafuji Kumamoto University
10/27 Thu
Room A (Apollon B)
G-4 Functional Coatings9:00-12:10
Society for Specialty Film Takao MATSUI and Yasuhiro OKADA Society for Specialty Film Development of new urethane acrylate oligomer for flexible hardcoatings. K. Kanda The Nippon Synthetic Chemical Industry Co., LTD., Nanodomain Control in Photo-cured Coatings via Precise Polymerization Technique Takeo Suga, Kari Katayama, Eigo Ando, and Niroyuki Nishide Waseda University Development and examination of UV-curable hard coating hybrid thin film having a 9H pencil hardness Ryo Muraguchi, Mitsuaki Kumazawa, and Yuhko Hakoshima JGC Catalysts and Chemicals Ltd. Development of UV-curable resin for the surface protective materials of the flexible displays N. Inoue, M. Ito, and K. Yamaguchi DIC Corporation Development of fluorochemical surface modifiers for UV curable hard coatings R. Hashide, Y. Ozaki, and N. Koike DIC Corporation Highly-filled Nanoparticle Coatings Naota Sugiyama Corporate Research Materials Laboratory, 3M Japan Limited
Room B (Apollon A)
S-3 Printed Electronics(Japanese)9:00-10:00
Advanced printing technology for flexible device fabrication Toshihide Kamata National Institute of Advanced Industrial Science and Technology Japan Advanced Printed Electronics Technology Research Association Yasuyoshi Mishima and Shinichi Nishi Japan Advanced Printed Electronics Technology Research Association Nano-ink development for wearable printed electronics K. Suganuma, M. Nogi, H. Koga, J. Jiu, and T. Sugahara Institute of Scientific and Industrial Research, Osaka University
G-5 Others10:00-11:50
Technology of removable acrylic pressure sensitive adhesive by UV-radiation T.Takeda Advanced Material Laboratory, The Nippon Synthetic Chemical Industry Co., LTD. New EB curable CI-Flexo ink technology providing sustainable printing solutions for packaging applications Im Rangwalla Energy Sciences Inc. Bio-based Photocurable Polymer Systems Dean C. Webster, Adlina Paramarta, Partha Sengupta, and Samantha Silbertr North Dakota State University
Room C (Sirius A)
G-2 Advanced Materials and Applications9:00-11:50
EB Induced Resistances to Misting, Elastic Deformation and Fracture for LCD Thin Panel Anna Takahashi, Ryo Nomura, Keisuke Iwata, Takehisa Shibuya, Yoshihito Matsumura and Yoshitake Nishi Graduate School of Engineering, Tokai University Yoshitake Nishi Department of Materials Science, Tokai University EB Induced Fracture Resistance of a Ti / Thermoplastic Polymers (PC, ABS) Joints H. Hasegawa, and N.Tsuyuki Graduate School of Engineering, Tokai University Y.Enomoto, M.C.Faudree, Y.Matsumuara, I.Jimbo, and Y.Nishi School of Engineering, Tokai University EB induced Adhesion Force of Metal(Cu,Al,Ti) / Polyurethane(PU) Arata Yagi, Sagiri Takase, Itaru Jinbo, and Yoshitake Nishi Tokai University Masae Kanda Chubu University EB induced Adhesion Improvement of CFRP/18-8 stainless steel sheets A. Minegishi, D. Kitahara, I. Jimbo and Y. Nishi Tokai University K. Masae Center of Applied Superconductivity & Sustainable Energy Research Development of Acrylic syrup utilizing RAFT polymerization and its application to UVcurable Pressure Sensitive Adhesive N. Ishikawa and T. Yoshida Soken Chemical & Engineering Co., Ltd. Development of Cyclopolymerizable Monomers giving Tetrahydrofuran Ring in the Polymer Backbone T.Gomi, T.Kaneko, A.Tachibana and Y. Arimoto Nippon Shokubai Co.,Ltd. EB Induced Adhesion of Different Polymers Laminations Sagiri Takase, Arata Yagi, Chisato Kubo, Masae Kanda, Yoshihito Matsumura and Yoshitake Nishi Tokai University
Room A (Apollon B)
G-4 Functional Coatings13:30-15:00
Photochemical and photophysical molecular alignment control for photonic and mechanical applications A. Shishido, K. Hisano, J. Wang, N. Akamatsu Laboratory for Chemistry and Life Science, Tokyo Institute of Technology A. Shishido PRESTO, JST Facile Fabrication of Photoaligned Films using Photoinactive Liquid Crystalline Polymer Coated with Photoreactive Monomers Ryosuke Fujii, Satoshi Minami, Tomoro Uchikawa, Yu Fujioka, Mizuho Kondo, and Nobuhiro Kawatsuki Department of Applied Chemistry, Graduate School of Engineering, University of Hyogo Self-healing Organic-inorganic Hybrid Coatings by Photocrosslinking with Thiol-contained Polysilsesquioxane Kimihiro Matsukawa Kyoto Institute of Technology Osaka Municipal Technical Research Institute Kazuya Nishio, Koji Mitamura, and Seiji Watase Osaka Electro-Communication University Ikuto Urano and Daiki Tohmori Doshisha University
Room B (Apollon A)
G-5 Others13:30-15:10
Cross-linking reagent derived from cysteine and its application to anionic UV curing M. Furutani, S. Sato, and K. Arimitsu Department of Pure and Applied Chemistry, Tokyo University of Science Modified Acrylic Oligomers Applied in UV Mono-Coating Shengyan ZHANG and Liting YU Guangzhou Wraio chemicals Co., Ltd. Polymer Flow Scheme under Chemical Substances Control Law Tomohiro Yoshida and Kazutomo Akasaka Toray Research Center, Inc. Notification of Chemical Substances Control Law for Low Molecular Weight Substance Shojiro Sueta Chemicals Evaluation and Research Institute
Room C (Sirius A)
G-2 Advanced Materials and Applications13:30-14:30
Study of relationship between adhesion and monomer structure Kazuki Noura Osaka Organic Chemical Industry Ltd Development of Functional Elastomers M. Kouda, Y. Tomimori, K. Fujii, and T. Matsuyama Osaka Organic Chemical Industry LTD. EB Induced Adhesive Force of Polycarbonate (PC) / Light Metals (Al, Ti) Lamination A. Masataka Tomizawa and C. Takase Sagiri Graduate School of Engineering, Tokai University B. M.C. Faudree, E. Itaru Jinnbo, and F. Yoshitake Nishi Department of Materials Science, Tokai University D. Masae Kanda Chubu University

Poster 10/26 Wed

Room D (Sirius A)
Poster Session15:50-17:20
Water soluble cellulose resist material in electron beam lithography Satoshi Takei and Makoto Hanabata Toyama Prefectural University Satoshi Takei Osaka University Akihiro Oshima, Miki Kashiwakura, Takahiro Kozawa, and Seiichi Tagawa Osaka University Negative-working resist materials of calixarene-containing polymers with pendant with pendant haloalkyl groups H. Ogawa and H. Kudo Department of Chemistry and Materials Engineering , Faculty of Chemistry, Materials and Bioengineering, Kansai University H. Yamamoto and T. Kozawa Institute of Scientific and Industrial Research, Osaka University Synthesis and resist-properties of hyperbranched polyacetal for electron beam (EB) and extreme ultraviolet (EUV) photoresist materials. H. Takeda and H. Kudo Department of Chemistry and Materials Engineering , Faculty of Chemistry, Materials and Bioengineering, Kansai University H. Yamamoto and T. Kozawa Institute of Scientific and Industrial Research, Osaka University Large-Scale Flexible Conductive Copper-Silver Pattern Based on Direct Photo-Patterning via Volume Additive Process Bowen Wang, Dongdong Hu, Jun Nie, and Xiaoqun Zhu State Key Laboratory of Chemical Resource Engineering, Beijing University of Chemical Technology Analysis of Network Structures in Thiol-ene UV Curing System Using Reworkable Monomers K. Nakata, M. Yamagaki, H. Okamura, and A. Matsumoto Department of Applied Chemistry, Osaka Prefecture University Study on THz imaging by using the coherent Cherenkov radiation M. Nishida, M. Brameld, and M. Washio Research Institute for Science and Engineering, Waseda University, Japan K. Sakaue Waseda Institute for Advanced Study, Waseda University, Japan R. Kuroda and Y. Taira National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan Improvement of pulse radiolysis system by introducing the femtosecond fiber laser Y. Soeta, Y. Saito, Y. Hosaka, and M. Washio Research Institute for Science and Engineering, Waseda University, Tokyo, Japan K. Sakaue Waseda Institute for Advanced Study, Waseda University, Tokyo, Japan STUDY ON TERAHERTZ WAVE TIME-DOMAIN SPECTROSCOPY SYSTEM BASED ON PHOTOCATHODE RF ELECTRON GUN Ryo Yanagisawa, Tomoyoshi Toida, Masakazu Washio, and Akira Endo Research Institute for Science and Engineering, Waseda University, Tokyo, Japan Kazuyuki Sakaue Waseda Institute for Advanced Study, Waseda University, Tokyo, Japan Koichi Kan Institute of Scientific and Industrial Research, Osaka University, Osaka, Japan The application of EB-grafted membrane for IPMC actuator Ryuki Yokota, Yumi Yamahara, Toru Hinata, and Masakazu Washio RISE Waseda University Akihiro Oshima Graduate school of engineering, Osaka University Development of organic / inorganic hybrid proton exchange membranes for direct methanol fuel cell Ippei Kawanaka, Ryo Urushibata, Takehiro Nishidome, Takashi Takura, and Masakazu Washio RISE Waseda University Akihiro Oshima Graduate school of engineering, Osaka University Fabrication of various function graded membrane with acrylic acids using radiation-induced graft-polymerization T. Nishidome, R. Urushibata, I. Kawanaka, T. Takura, and M. Washio RISE Waseda University A. Oshima Graduate school of engineering, Osaka University Nanostructure of the functionalized fluorinated polymer studied by positron annihilation lifetime spectroscopy T. Oka, and T. Sekine Institute for Excellence in Higher Education, Tohoku University T. Oka, K. Onodera, Y. Kino, and T. Sekine Department of Chemistry, Tohoku University A. Oshima Graduate School of Engineering, Osaka University M. Washio Research Institute for Science and Engineering, Waseda University Reagent-Free Functional Gelatin Scaffolds Fabricated by Quantum Beam Nanoimprint Lithography T. G. Oyama, A. Kimura, and M. Taguchi Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology K. Oyama Department of cell physiology, The Jikei University School of Medicine Development of Radiation-Grafted Fibrous Adsorbent for trivalent and hexavalent chromium removal N. Hayashi Education Program of Materials and Bioscience, Graduate School of Science and Technology, Gunma University Y. Ueki, and N. Seko Department of Advanced Functional Materials Research, Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology Development of Ion-Exchange Membrane Using an Electron-Beam-Induced T. Nagatani, T. Karube, and N. Yoshikawa The Salt Industry Center of Japan, Research Institute of Salt and Sea Water Science Synthesis of fibrous grafted polymer as heterogeneous acid-type catalyst for biodiesel fuel production from free fatty acids Y. Ueki, S. Saiki, H. Hoshina, and N. Seko Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology Vanadium recovery from seawater by radiation grafted adsorbents based on polyethylene terephthalate fiber S. Saiki, N. Kasai, and N. Seko National Institutes for Quantum and Radiological Science and Technology T. Oida and K. Yamagishi SEIREN Co., Ltd. M. Matsuhisa and T. Kawashima THE KANSAI ELECTRIC POWER CO., INC. Development of Radiation Grafted Anion-Conducting Electrolyte Membranes and Application to Hydrazine Hydrate Fuel Cells Kimio Yoshimura, Hiroki Akihiro, and Yasunari Maekawa National Institutes for Quantum and Radiological Science and Technology (QST) Hideyuki Shishitani, Susumu Yamaguchi, and Hirohisa Tanaka Daihatsu Motor Co., Ltd. Selective introduction of functional groups onto photo-irradiated surface of polyetherimide film by reaction development patterning Hisashi Ogasawara and Toshiyuki Oyama Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University Study of Adhesion Properties of Cu on Photosensitive Insulation Film for Next Generation Packaging Kenichi IWASHITA Photosensitive Materials R&D department, Hitachi Chemical Co., Ltd. Development of Nobel UV Curable Black Resin Junichi IKEDA Kyoeisha Chemical Co., Ltd. Photo Base Generator With High Stability Under The Carboxylic Acid System K. Yanaba*, N. Sakai, and S. Imazeki. Wako Pure Chemical Industries, Ltd., New classes of urethane acrylate oligomers with unique physical properties Zahidul AMIN and Toshiya SUGIMOTO Arkema K.K., JAPAN Mingxin FAN Sartomer Asia Limited, CHINA Development of Easy Peeling Pressure-Sensitive Adhesive by the use of Ultrasonic Irradiation H. Tachi, and Y. Inoue Textile & Polymer Section, Technology Research Institute of Osaka Prefecture Ascaling relation of UV intensity and gelation time in UV-induced photopolymerization of multi-functional monomer H. Kondo and K. Taki Kanazawa University Kinetic analysis for photo-induced polymerization of multifunctional monomer and reactive polymer R. Hayashi and K. Taki Kanazawa University UV curable organic conductive film N. Ohashi, M. Chikazawa, and Y. Ito Chukyo-yushi co., ltd. Photo-tuning of Refractive Indices of Photocrosslinked Blends of Multifunctional Diphenylfluorene Derivatives and Polysilanes M. Iseki, H. Okamura, and A. Matsumoto Department of Applied Chemistry, Osaka Prefecture University K. Minokami and S. Miyauchi Osaka Gas Chemical Co., Ltd. Preparation and photoluminescent behavior of mechanochromic polymer composite films using poly(methyl methacrylate) and cyanostilbazole derivative Mizuho Kondo, Seiya Miura and Nobuhiro Kawatsuki Department of Applied Chemistry Graduate of Engineering, University of Hyogo Effect of chemical structure of acid on mechanoinduced change in photoluminescent color in dye/acid complex Taku Yamoto, Mizuho Kondo, and Nobuhiro Kawatsuki Department of Applied Chemistry Graduate of Engineering, University of Hyogo Anti-glare layer formation on PC using UV curable resin and high-pressure UV exposure K. Niinuma and K. Taki Kanazawa University Photo-polymerization induced phase separation to fabricate elaborate Bragg diffractors composed of liquid crystal and polymer phases Hiroshi Kakiuchida Structural Materials Research Institute, National Institute of Advanced Industrial Science and Technology Akifumi Ogiwara Department of Electronic Engineering, Kobe City College of Technology Radiation-induced Crosslinking of Poly(butylene adipate-co-telephtalate) Copolymer N. Nagasawa and M. Taguchi National Institutes for Quantum and Radiological Science and Technology (QST) M. Akaoka and H. Mitomo Gunma University Radiation Induced Chemical Reactions in a Model Compound of Polymer-Resist T. Kondoh, M. Gohdo, K. Kan, J. Yang, S. Tagawa, and Y. Yoshida The Institute Scientifc and Industrial Research, Osaka University The development of novel photoinitiators and their application to radical UV-curing materials Taku Ishii, Ogawa Teruhiko, and Katsuma Katsuhiko The Nippon Synthetic Chemical Industry Co.,Ltd., Central Research Laboratory Properties Evaluation of Polyglycerol-based Acrylic Monomer Tomomi Nada and Yuka Noguchi Sakamoto Yakuhin Kogyo Co., Ltd.

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